Epitaxy for Si CMOS Devices

IR provides outsourced services for Si epitaxy used in CMOS applications. Epitaxy processes for both CMOS logic and memory applications are available as well as epi for SOI substrates and selective SiGe deposition in recessed source/drain regions for enhanced mobility channel PMOS devices.

IR Epitaxial Services operates 24 hours per day and 7 days per week in order to meet the needs of our customers for short turn-around time. Our customer base is world-wide and includes some of the largest names in semiconductor manufacturing as well as research institutes and universities.

IR Epitaxial Services is QS-9000, ISO 9001:2000 and ISO 14001 certified. Certification to the ISO/TS 16949 standard is scheduled to occur during Q3-CY2005.